Infrared Picosecond Laser Source

红外皮秒激光器
The laser source Meets the requirements for high-precision applications such as cutting, drilling, and through-hole machining of glass, sapphire, and special materials, with a small heat-affected zone and stable processing quality, suitable for various industries including consumer electronics and high-end manufacturing.The infrared ultrafast laser system features an average power of up to 300W and a single pulse energy of 3.5mJ, combined with excellent beam quality (M² < 1.3) and flexible control interfaces (RS232, GATE, TRIG, supporting PSO function), ensuring both processing efficiency and system stability when performing complex processes such as cutting thick glass (>19mm). The modular structure design facilitates integration and maintenance, making it suitable for mass continuous production environments.
  • Its power can be up to 300W, with pulse energy reaching up to 3.5mJ, suitable for cutting glass materials with thickness greater than 20mm.
  • Excellent beam quality(M*< 1.3)
  • Supports RS232,GATE and TRlG control, also with PSO function.
  • Modular design, stable structure, easy maintenance.
PHIR Series
Wavelength
1064nm
Average Power
>100W
Frequency
30-2000KHz
Pulse Energy
≥3.5mj
Pulse Width
10ps
Beam Quality
M²<1.3
Beam Diameter
3mm
Beam Divergence Angle
<16urad
Pwer Stability
RMS ≤ 0.8%
下载完整资料
  • Brittle material processing (sapphire/glass drilling, cutting, for consumer electronics cover plates and optical components)
  • Metal Precision Processing (Marking of Aerospace Titanium Alloys, Micro-pore Machining of Fuel Nozzles)
  • New energy manufacturing (lithium battery electrode sheet cleaning, photovoltaic silicon wafer scribing)

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